The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
Feb. 23, 2006
Applicants:
Hisayuki Takasu, Higashiibaraki, JP;
Kouichi Miyazawa, Mito, JP;
Toru Iwaya, Hitachiota, JP;
Inventors:
Assignee:
Hitachi Science Systems, Ltd., Ibaraki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.