The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2007
Filed:
Apr. 22, 2004
Ilya Leizerson, Technion Halfa, IL;
Stephen G. Lipson, Halfa, IL;
Ilya Leizerson, Technion Halfa, IL;
Stephen G. Lipson, Halfa, IL;
Abstract
A method and device for determining the topography of a thin film having a front surface and a back surface. The method comprises: irradiating the film with an incident coherent or partially coherent light beam so as to get two reflected beams, the first reflected beam being reflected from the front surface of the film, and the second beam being reflected from the back surface of the film; creating an interferometric image from a united beam comprising the two reflected beams and a reference beam, the reference beam originating from the incident beam, and made to be substantially parallel to the two reflected beams. The reference beam acquires a phase shift. The interferometric image is created the interference between a combined beam comprising the reference beam and the second reflected beam, and the first reflected beam, thus acquiring information on the topography of the film, that cannot be acquired using the two reflected beams alone.