The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2007
Filed:
Jun. 17, 2005
Katsuto Sumi, Kanagawa-ken, JP;
Takayuki Uemura, Kanagawa-ken, JP;
Katsuto Sumi, Kanagawa-ken, JP;
Takayuki Uemura, Kanagawa-ken, JP;
Fuji Photo Film Co., Ltd., Kanagawa-ken, JP;
Abstract
In an image drawing apparatus and an image drawing method for forming a desired two-dimensional pattern on an image drawing surface by using a plurality of image drawing heads, uneven density and resolution caused by errors in relative positions of the heads and installation angles thereof and by an effect of pattern distortion can be reduced. A rectangular two-dimensional pixel array is installed in each of exposure heads in an exposure apparatus (image drawing apparatus) so as to make a predetermined angle with the direction of scanning, facing an exposure surface of a photosensitive material. Combinations of slits and photo detectors detect positions of light spots in the exposure surface comprising inter-head relay areas. Pixels in the pixel arrays are selected so as to realize N-overlay exposure ideally by causing overexposure and underexposure to be minimal in the inter-head relay areas.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile