The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2007
Filed:
Nov. 29, 2005
Applicant:
Bernhard R. Liegl, Beacon, NY (US);
Inventor:
Bernhard R. Liegl, Beacon, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/28 (2006.01); G01R 31/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a method for determining processing image induced defects in the manufacture of semiconductor products such as wafers by analyzing the circuit design of the product mask and modifying a conventional test defect structure to mimic the product mask to incorporate one or more isolated or other features including product mask circuit features likely to cause processing image induced defects into the test defect structure.