The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2007

Filed:

Sep. 26, 2003
Applicants:

Alessandro Grossi, Milan, IT;

Roberto Bez, Milan, IT;

Giorgio Servalli, Ciserano, IT;

Inventors:

Alessandro Grossi, Milan, IT;

Roberto Bez, Milan, IT;

Giorgio Servalli, Ciserano, IT;

Assignee:

STMicroelectronics S.r.l., Agrate Brianza, IT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a process for the fabrication of integrated resistive elements with protection from silicidation, at least one active area () is delimited in a semiconductor wafer (). At least one resistive region () having a pre-determined resistivity is then formed in the active area (). Prior to forming the resistive region (), however, a delimitation structure () for delimiting the resistive region () is obtained on top of the active area (). Subsequently, protective elements () are obtained which extend within the delimitation structure () and coat the resistive region ().


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