The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2007

Filed:

Jun. 14, 2006
Applicants:

Satoshi Tomimatsu, Kokubunji, JP;

Kaoru Umemura, Musashino, JP;

Yuichi Madokoro, Kokubunji, JP;

Yoshimi Kawanami, Kokubunji, JP;

Yasunori Doi, Kokubunji, JP;

Inventors:

Satoshi Tomimatsu, Kokubunji, JP;

Kaoru Umemura, Musashino, JP;

Yuichi Madokoro, Kokubunji, JP;

Yoshimi Kawanami, Kokubunji, JP;

Yasunori Doi, Kokubunji, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A specimen fabrication apparatus including: an ion source, an optical system for irradiating a projection ion beam to a sample, wherein the optical system includes a patterning mask to form a ion beam emitted from the ion source into the projection ion beam, a sample stage to mount the sample, a vacuum specimen chamber to contain the sample stage, a probe for separating a micro-specimen from the sample by irradiation of the projection ion beam, a specimen holder to fix the micro-specimen, wherein the projection ion beam is irradiated to the micro-specimen fixed to the specimen holder and extracted by the probe in the specimen chamber, so that a finish fabrication to the micro-specimen is enabled.


Find Patent Forward Citations

Loading…