The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2007
Filed:
Sep. 24, 2004
Yukio Hanamoto, Toyonaka, JP;
Satoshi Yamamoto, Toyonaka, JP;
Yukio Hanamoto, Toyonaka, JP;
Satoshi Yamamoto, Toyonaka, JP;
Sumitomo Chemical Company, Limited, Osaka, JP;
Abstract
The present invention provides a method for evaluating a solution for a coating film for semiconductor, which comprises measuring Clogging Degree of a solution for a coating film for semiconductor when the solution is filtrated through a filter having an average pore size of 0.01 to 0.4 μm, and estimating quality of the coating film formed from the solution, wherein the Clogging Degree is defined by the following formula:Clogging Degree=21 According to the present method, quality of coating films can be figured out without actual formation of the coating films, and solutions for coating films can be evaluated thereby.