The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2007
Filed:
Jul. 30, 2003
Ross H. Hill, Coquitlam, CA;
Sharon Louise Blair, Coquitlam, CA;
Grace LI, Coquitlam, CA;
Xin Zhang, Burnaby, CA;
Haixiong Ruan, Burnaby, CA;
Ross H. Hill, Coquitlam, CA;
Sharon Louise Blair, Coquitlam, CA;
Grace Li, Coquitlam, CA;
Xin Zhang, Burnaby, CA;
Haixiong Ruan, Burnaby, CA;
Simon Fraser University, Burnaby, CA;
Abstract
The invention generally encompasses a method for forming a pattern on a substrate. The method comprises applying a precursor comprising at least one metal to a substrate to form a precursor layer, exposing a predetermined portion of the precursor layer and developing the predetermined portion of the precursor layer. The developing step removes, or at least substantially removes, the predetermined portion from the substrate, thereby forming a pattern on the substrate that comprises a remaining portion of the precursor. In one embodiment, the precursor layer comprises Ti(PrO)(EAA).