The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7175966 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 13, 2007

Filed:

Sep. 19, 2003
Applicants:

Katherina E Babich, Chappaqua, NY (US);

Alfred Grill, White Plains, NY (US);

Arpan P Mahorowala, Bronxville, NY (US);

Dirk P Pfeiffer, Dobbs Ferry, NY (US);

Inventors:

Katherina E Babich, Chappaqua, NY (US);

Alfred Grill, White Plains, NY (US);

Arpan P Mahorowala, Bronxville, NY (US);

Dirk P Pfeiffer, Dobbs Ferry, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/075 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
Abstract

A multilayer lithographic structure which includes a substrate, having on a major surface thereof a first layer including a water and/or aqueous base soluble material which includes Ge, O, and H, and optionally X, wherein X is at least one of Si, N, and F; and disposed on the first layer a second layer which includes an energy photoactive material.


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Babich, Katherina. (2007). Water and aqueous base soluble antireflective coating/hardmask materials (U.S. Patent No. 7175966). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7175966

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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