The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2007

Filed:

Feb. 17, 2006
Applicants:

Ting Tao, Fort Collins, CO (US);

Paul R. West, Fort Collins, CO (US);

Scott A. Beckley, Windsor, CO (US);

Nicki R. Miller, Ft. Collins, CO (US);

Inventors:

Ting Tao, Fort Collins, CO (US);

Paul R. West, Fort Collins, CO (US);

Scott A. Beckley, Windsor, CO (US);

Nicki R. Miller, Ft. Collins, CO (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/032 (2006.01); G03F 7/033 (2006.01); G03F 7/031 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A negative-working radiation-sensitive composition includes a polymeric binder comprising a polymer backbone and having attached thereto a carbazole derivative represented by the following Structure (I): wherein Y is a direct bond or a linking group, and Rto Rare independently hydrogen, or an alkyl, alkenyl, aryl, halo, cyano, alkoxy, acyl, acyloxy, or carboxylate groups, or any adjacent Rthrough Rgroups can together form a carbocyclic or heterocyclic group or a fused aromatic ring. The composition can be sensitive to radiation having a maximum wavelength of from about 150 to about 1500 nm, and can be used to prepare negative-working imageable elements that be imaged and developed as lithographic printing plates.


Find Patent Forward Citations

Loading…