The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2007
Filed:
Dec. 28, 2002
Cheon-soo Cho, Gyeongsangnam-Do, KR;
Dong-sik Youn, Gyeongsangnam-Do, KR;
Hyun-wook Lee, Gyeongsangnam-Do, KR;
Samchul Ha, Gyeongsangnam-Do, KR;
Hyun-woo Jun, Gyeongsangnam-Do, KR;
Cheon-Soo Cho, Gyeongsangnam-Do, KR;
Dong-Sik Youn, Gyeongsangnam-Do, KR;
Hyun-Wook Lee, Gyeongsangnam-Do, KR;
Samchul Ha, Gyeongsangnam-Do, KR;
Hyun-Woo Jun, Gyeongsangnam-Do, KR;
LG Electronics Inc., Seoul, KR;
Abstract
A surface treatment system in which gas for a deposition reaction is injected into a deposition chamber and power is applied to form a deposition reaction to form a deposition layer at a surface of an object or surface treatment, wherein the deposition chamber has a plurality of deposition spaces disposed in parallel and a convey unit for conveying one or more objects of surface treatment to each deposition space or discharging the objects of surface treatment from each deposition space after a deposition reaction.