The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2007
Filed:
Mar. 04, 2005
Gang Zhao, Sumter, SC (US);
H. Wayne Richardson, Sumter, SC (US);
Gang Zhao, Sumter, SC (US);
H. Wayne Richardson, Sumter, SC (US);
Phibro-Tech, Inc., Ridgefield Park, NJ (US);
Abstract
Spent, acidic solutions comprising cupric chloride and hyrdrochloric acid from the copper etching process are regenerated by a process in which the acid is subjected to distillation with sulfuric acid. In one embodiment, the process comprises (a) providing a spent etchant comprising at least about 10% by weight chloride and at least about 5% dissolved copper; (b) adding at least about 2 moles of sulfuric acid per mole of dissolved copper to the spent etching solution, thereby converting copper chloride into hydrochloric acid and precipitated copper sulfate; (c) distilling the mixture from step (b) to vaporize at least a portion of the hydrochloric acid; (d) condensing at least a portion of the vaporized hydrochloric acid; (e) separating at least a portion of the precipitated copper sulfate from the residual liquid, wherein said residual liquid comprises sulfuric acid; and (f) reusing at least a portion of the residual liquid as a sulfuric acid source in step (b).