The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2007
Filed:
Nov. 01, 2002
Mitsuo Tsukamoto, Settsu, JP;
Kenji Otoi, Settsu, JP;
Hideki Nakaya, Settsu, JP;
Yoshiyuki Hiraga, Settsu, JP;
Tomohisa Noda, Settsu, JP;
Mitsuo Tsukamoto, Settsu, JP;
Kenji Otoi, Settsu, JP;
Hideki Nakaya, Settsu, JP;
Yoshiyuki Hiraga, Settsu, JP;
Tomohisa Noda, Settsu, JP;
Daikin Industries, Ltd., Osaka, JP;
Abstract
The present invention has for its object to provide a method of producing fluoropolymers with high productivity under comparatively low temperature and low pressure conditions which are conducive to reduced cost of commercial-scale production equipment. The present invention is directed to a method of producing a fluoropolymer which comprises polymerizing a radical polymerizable monomer in a defined reaction-field, said radical polymerizable monomer comprising a fluorine-containing ethylenic monomer and said defined reaction-field being in supercriticality-expression state with a monomer density [ρ]-monomer critical density [ρ] ratio of [ρ/ρ] not less than 1.1.