The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2007
Filed:
Nov. 06, 2003
Kyu-dong Jung, Suwon, KR;
Chan-bong Jun, Seoul, KR;
Hyung Choi, Sungnam, KR;
Seok-jin Kang, Suwon, KR;
Seog-woo Hong, Busan, KR;
Seok-whan Chung, Suwon, KR;
Moon-chul Lee, Sungnam, KR;
Eun-sung Lee, Daejeon, KR;
Kyu-dong Jung, Suwon, KR;
Chan-Bong Jun, Seoul, KR;
Hyung Choi, Sungnam, KR;
Seok-jin Kang, Suwon, KR;
Seog-woo Hong, Busan, KR;
Seok-whan Chung, Suwon, KR;
Moon-chul Lee, Sungnam, KR;
Eun-sung Lee, Daejeon, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A method and apparatus for vacuum-mounting at least one micro electro mechanical system (MEMS) on a substrate includes a gas injecting section for injecting an inert gas into a vacuum chamber; a substrate aligning section for aligning a semiconductor substrate and a cover, the cover having a cavity formed therein and a getter attached to an interior surface of the cavity; a bonding section for bonding the semiconductor substrate and the cover together; and a controlling section for controlling the substrate aligning section to align the semiconductor and the cover, for controlling the gas injecting section to inject the inert gas into the vacuum chamber, and for controlling the bonding section to bond the semiconductor substrate and the cover together after the inert gas is injected.