The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2007
Filed:
May. 24, 2005
John F. Szul, Hurricane, WV (US);
James Mcleod Farley, League City, TX (US);
Laughlin G. Mccullough, League City, TX (US);
Ryan Winston Impelman, Houston, TX (US);
John F. Szul, Hurricane, WV (US);
James McLeod Farley, League City, TX (US);
Laughlin G. McCullough, League City, TX (US);
Ryan Winston Impelman, Houston, TX (US);
Univation Technologies, LLC, Houston, TX (US);
Abstract
A polyethylene film having a balance of improved physical and mechanical properties and a method for making the same are provided. In one aspect, the film includes a 1% secant modulus of greater than 25,000 psi, a dart impact resistance of greater than 500 g/mil, and a MD tear strength of greater than 500 g/mil. In one aspect, the method comprises reacting ethylene derived units and a comonomer in the presence of a hafnium-based metallocene at a temperature of from 70° C. and 90° C., an ethylene partial pressure of from 120 psia and 260 psia, and a comonomer to ethylene ratio of from 0.01 to 0.02 to produce an ethylene based polymer. The method further comprises extruding the ethylene based polymer at conditions sufficient to produce a polyethylene film comprising a secant modulus of greater than 25,000 psi, a dart impact resistance of greater than 500 g/mil, and a MD tear strength of greater than 500 g/mil.