The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2007
Filed:
Jul. 27, 2004
Applicants:
Arthur Raymond Piehl, Corvallis, OR (US);
Sriram Ramamoorthi, Corvallis, OR (US);
Daniel C. Gardner, Corvallis, OR (US);
Inventors:
Arthur Raymond Piehl, Corvallis, OR (US);
Sriram Ramamoorthi, Corvallis, OR (US);
Daniel C. Gardner, Corvallis, OR (US);
Assignee:
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An antireflection surface formed using a plurality of nanostructures of a first material on a surface of a second material. The first material is different from the second material. The distribution of spatial periods of the nanostructures is set by a self-assembly operation. The surface of the second material is converted to operate as a graded index surface that is substantially antireflective for the wavelength of interest.