The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2007

Filed:

Oct. 11, 2005
Applicants:

Hirofumi Hideshima, Tokyo-To, JP;

Hiroki Oka, Tokyo-To, JP;

Inventors:

Hirofumi Hideshima, Tokyo-To, JP;

Hiroki Oka, Tokyo-To, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 29/70 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a shadow mask, a large number of slotsare made in a mask bodyin the horizontal direction X and in the vertical direction Y. Each slothas a roughly rectangular backside opening, a roughly rectangular front-side opening, and a through-holethat connects these two openings. Of the multiple slotsmade in the mask body, the slotssituated at least in those areas of the mask bodythat are surrounded by a horizontal axisand two diagonal axesthat pass through the center pointof the mask bodyhave such front-side openingsthat a pair of the upper and lower short sidesof the rectangular outline of the front-side openingof each slotare inclined, relative to the horizontal axis, along the radiate lineradiating from the center pointof the mask bodytoward the slot. The angle of inclination β of the short sidesis preferably in the range of a α±10°, where α is the angle between the radiate lineradiating from the center pointof the mask body toward the slotand the horizontal axis


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