The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2007

Filed:

Sep. 15, 2005
Applicants:

Ui-hui Kwon, Gyeonggi-do, KR;

Gyeong-su Keum, Gyeonggi-do, KR;

Won-young Chung, Gyeonggi-do, KR;

Kwang-ho Cha, Gyeonggi-do, KR;

Young-tae Kim, Gyeonggi-do, KR;

Seung-ki Chae, Seoul, KR;

Jai-hyung Won, Seoul, KR;

Young-kwan Park, Gyeonggi-do, KR;

Tai-kyung Kim, Gyeonggi-do, KR;

Inventors:

Ui-hui Kwon, Gyeonggi-do, KR;

Gyeong-su Keum, Gyeonggi-do, KR;

Won-young Chung, Gyeonggi-do, KR;

Kwang-ho Cha, Gyeonggi-do, KR;

Young-tae Kim, Gyeonggi-do, KR;

Seung-ki Chae, Seoul, KR;

Jai-hyung Won, Seoul, KR;

Young-kwan Park, Gyeonggi-do, KR;

Tai-kyung Kim, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention can provide ion implanter devices including an arc chamber including at least a first inner region and a second inner region, an electron emitting device disposed in the arc chamber adjacent the first inner region and adapted to emit electrons, an electron returning device disposed in the arc chamber adjacent the second inner region and adapted to return at least some of the electrons emitted from the electron emitting device into the second inner region; and an electric field and magnetic field generating device adapted to provide a magnetic field to the arc chamber, wherein at least one inner wall of the arc chamber has a convex surface.


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