The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2007
Filed:
Apr. 12, 2004
Hideo Kurashima, Yokohama, JP;
Akira Kobayashi, Yokohama, JP;
Kouji Yamada, Yokohama, JP;
Tsunehisa Namiki, Yokohama, JP;
Hideo Kurashima, Yokohama, JP;
Akira Kobayashi, Yokohama, JP;
Kouji Yamada, Yokohama, JP;
Tsunehisa Namiki, Yokohama, JP;
Toyo Seikan Kaisha Ltd., Tokyo, JP;
Abstract
A microwave plasma processing method is provided which enables a uniform thin film layer to be formed on a surface to be processed and which enables a short time processing. In the microwave plasma processing method, microwaves are introduced into a plasma processing chamber, and a processing gas is transformed into plasma to form a thin film layer on a base substancedisposed in the plasma processing chamber, and the method comprises: fixing the base substancecoaxially with a central axis of the plasma processing chamber; setting a standing wave mode of the microwaves in the plasma processing chamber to a TE mode or a TEM mode from a mouth portionto a body portionof the base substance; and setting a mode having both the TE mode and a TM mode in a bottom portionof the base substance.