The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7169917 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 30, 2007

Filed:

Jul. 06, 2001
Applicants:

Duarte Miguel DE Franca Teixeira Dos Prazeres, Lisbon, PT;

Maria Margarida Fonseca Rodrigues Diogo, Lisbon, PT;

Joao Antonio DE Sampaio Rodrigues Queiroz, Covilha, PT;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07H 21/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention refers to a new process for the production of purification of high purity plasmid DNA. The process comprehends: a) the production of cells containing plasmid DNA, b) the disruption of the cells in order to obtain a lysate containing plasmid DNA, c) a concentration step by precipitation with isopropanol, d) a pre-purification and conditioning step by the addition of ammonium sulphate, e) a purification step using hydrophobic interaction chromatography, f) a final concentration and/or buffer exchange step. The process is scaleable, it does not use enzymes or mutagenic agents and it enables the preparation of plasmid DNA with pharmaceutical grade, which complies with the requirements of regulatory agencies. The invention belongs to the technical domain of Biochemical Engineering/Biotechnology.


Find Patent Forward Citations

de Franca Teixeira dos Prazeres, Duarte. (2007). Purification of plasmid dna by hydrophobic interaction chromatography (U.S. Patent No. 7169917). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7169917

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