The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2007
Filed:
Dec. 02, 2003
Yi Yeol Lyu, Daejeon-Shi, KR;
Kwang Hee Lee, Gyeonggi-Do, KR;
Ji Man Kim, Gyeonggi-Do, KR;
Seok Chang, Daejeon-Shi, KR;
Jin Heong Yim, Daejeon-Shi, KR;
Jae Geun Park, Daejeon-Shi, KR;
Yi Yeol Lyu, Daejeon-Shi, KR;
Kwang Hee Lee, Gyeonggi-Do, KR;
Ji Man Kim, Gyeonggi-Do, KR;
Seok Chang, Daejeon-Shi, KR;
Jin Heong Yim, Daejeon-Shi, KR;
Jae Geun Park, Daejeon-Shi, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
The present invention provides a composition for preparing porous dielectric thin films containing pore-generating material, said composition comprising gemini detergent, and/or a quaternary alkyl ammonium salt, a thermo-stable organic or inorganic matrix precursor, and solvent for dissolving the two solid components. There is also provided an interlayer insulating film having good mechanical properties such as hardness, modulus and hydroscopicity, which is required for semiconductor devices.