The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2007
Filed:
Mar. 22, 2002
Ingrid Fritsch, Fayetteville, AR (US);
Charles Sherman Henry, Starkville, MS (US);
Benjamin P. Bowen, Tempe, AZ (US);
Walter Vandaveer, Lawrence, KS (US);
Nicole Bratcher, Pittsburg, OK (US);
Ingrid Fritsch, Fayetteville, AR (US);
Charles Sherman Henry, Starkville, MS (US);
Benjamin P. Bowen, Tempe, AZ (US);
Walter Vandaveer, Lawrence, KS (US);
Nicole Bratcher, Pittsburg, OK (US);
Board of Trustees of the University of Arkansas, Little Rock, AR (US);
Abstract
Construction and characterization of microfabricated recessed disk microelectrodes (RDMs) of 14 and 55 μm diameter are reported. The work reported here makes several new contributions to the current literature on microfabricated RDMs. Hybrid blamers were constructed by fusion of vesicles of dimyristoylphosphatidyl choline (DMPC), which forms the top layer, with ethanol-rinsed SAMs of hexadecanethiol on gold, which form the bottom layer. Gramicidin A was included in the modifying solutions to incorporate it into hybrid blamers.