The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2007
Filed:
Jul. 21, 2004
Jyung-chan Lee, Daejon, KR;
Joon-ki Lee, Daejon, KR;
Yun-hee Cho, Seoul, KR;
Seung-il Myong, Daejon, KR;
Youn-seon Jang, Daejon, KR;
Yool Kwon, Busan, KR;
Kwangjoon Kim, Daejon, KR;
Moo-jung Chu, Daejon, KR;
Jyung-Chan Lee, Daejon, KR;
Joon-Ki Lee, Daejon, KR;
Yun-Hee Cho, Seoul, KR;
Seung-Il Myong, Daejon, KR;
Youn-Seon Jang, Daejon, KR;
Yool Kwon, Busan, KR;
Kwangjoon Kim, Daejon, KR;
Moo-Jung Chu, Daejon, KR;
Abstract
The present invention relates to a method for revising a wavelength of the EML by controlling a working temperature based on arithmetic functional relations between the DC-Offset voltage and the wavelength and between the working temperature and the wavelength, and a computer-readable recording medium thereof. The method includes the steps of: re-setting initial values of a working temperature, a amplifying voltage and the DC-Offset voltage; determining a wavelength with respect to the re-set DC-Offset voltage based on a functional relation between the DC-Offset voltage and the wavelength of the EML; and determining the revising working temperature for the determined wavelength based on the functional relation between the working temperature and the wavelength of the EML, and re-setting the working temperature with the revising working temperature.