The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Dec. 03, 2003
Applicants:
Joon MO Kang, Daejeon, KR;
MY the Doan, Singapore, SG;
Desmond R. Lim, Singapore, SG;
Inventors:
Assignees:
Agency for Science, Technology and Research, Singapore, SG;
Photonics Concepts Pte. Ltd., Singapore, SG;
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
One or more embodiments of the instant invention may be briefly summarized as follows. A planarization and smoothing segment includes: (a) a reverse mask and etching method; a sacrificial layer and selective CMP followed by non selective CMP; or a sacrificial layer and selective etching followed by non-selective CMP. A buffer layer to protect wave guide segment includes: (a) waveguide formation followed by buffer layer deposition; or a buffer deposition over the waveguide layer followed by waveguide formation.