The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Jul. 30, 2003
Marcello Mariani, Carnate, IT;
Lorena Beghin, Milan, IT;
Marcello Mariani, Carnate, IT;
Lorena Beghin, Milan, IT;
STMicroelectronics S.r.l., Agrate Brianza, IT;
Abstract
A method for manufacturing circuit structures integrated in a semiconductor substrate that includes regions, in particular isolation regions, includes the steps of:—depositing a conductive layer to be patterned onto the semiconductor substrate;—forming a first mask of a first material on the conductive layer;—forming a second mask made of a second material that is different from the first and provided with first openings of a first size having spacers formed on their sidewalls to uncover portions of the first mask having a second width which is smaller than the first;—partly etching away the conductive layer through the first and second masks such to leave grooves of the second width;—removing the second mask and the spacers; and—etching the grooves through the first mask to uncover the regions provided in the substrate and form conductive lines.