The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Aug. 02, 2004
Tomoyuki Furuhata, Sakata, JP;
Tomoyuki Furuhata, Sakata, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
Certain embodiments include a semiconductor device capable of preventing a retardation of signal transmission between the smallest units, a method for the manufacture thereof, a circuit substrate and an electronic device. Embodiments also include a manufacturing method comprising a laminating step of forming tunnel insulating filmsandfloating gatesanddielectric filmsandcontrol gatesandon first and second memory cell areasandformed mutually adjacent to each other on a semiconductor substratea plurality of impurity area formation steps of forming sources and drainsandon the first and second memory cell areasandand forming a connecting areacapable of forming an electric connection between oneof the source and drain of the first memory cell areaand oneof the source and drain of the second memory cell areaThe connecting areais formed to have a lower electric resistance than impurity areasandformed in one of the of impurity area formation steps.