The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Apr. 24, 2006
James F. Elman, Fairport, NY (US);
Dennis J. Massa, Pittsford, NY (US);
Charles C. Anderson, Penfield, NY (US);
Tomohiro Ishikawa, Rochester, NY (US);
James F. Elman, Fairport, NY (US);
Dennis J. Massa, Pittsford, NY (US);
Charles C. Anderson, Penfield, NY (US);
Tomohiro Ishikawa, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A process for manufacturing a multilayer compensator comprising one or more polymeric A layers and one or more polymeric B layers, wherein said A layers comprise a polymer having an out-of-plane birefringence not more negative than −0.01, said B layers comprise an amorphous polymer having an out-of-plane birefringence more negative than −0.01, and the overall in-plane retardation (R) of said multilayer compensator is greater than 20 nm and the out-of-plane retardation (R) of said multilayer compensator is more negative than −20 nm wherein the process employs laminating layers or coating the layers from solvent.