The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2007

Filed:

Oct. 15, 2003
Applicants:

Nripendra Nath Das, West Chester, OH (US);

Joseph David Rigney, Milford, OH (US);

Jeffrey Allan Pfaendtner, Blue Ash, OH (US);

Matthew David Saylor, Blanchester, OH (US);

Inventors:

Nripendra Nath Das, West Chester, OH (US);

Joseph David Rigney, Milford, OH (US);

Jeffrey Allan Pfaendtner, Blue Ash, OH (US);

Matthew David Saylor, Blanchester, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for forming diffusion aluminide coatings on an uncoated surface of a substrate, without interdiffusing a sufficient amount of aluminum into a coating layer to adversely affect the coating growth potential and mechanical properties of said coating layer. A metal substrate is provided comprising an external surface and an internal passage therein defined by an internal surface, at least a portion of the external surface of the substrate being coated with a coating layer selected from the group consisting of β-NiAl-base, MCrAlX, a line-of-sight diffusion aluminide, a non-line-of-sight diffusion aluminide, a pack diffusion aluminide, and a slurry diffusion aluminide on said substrate. The metal substrate is subjected to an aluminum vapor phase deposition process.


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