The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Mar. 15, 2002
Applicants:
John Sydney Carlow, Southampton, GB;
Ka Lok NG, Reading, GB;
James Timothy Shawcross, Charlbury, GB;
Inventors:
John Sydney Carlow, Southampton, GB;
Ka Lok Ng, Reading, GB;
James Timothy Shawcross, Charlbury, GB;
Assignee:
Accentus PLC, Didcot, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
A plasma reactor () of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material () positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on the surface. A preferred electrode arrangement provides surface discharge in the plasma at the surface of the layer of material.