The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2007

Filed:

Dec. 11, 2004
Applicants:

Antoni S Murcia, Poway, CA (US);

Yinan Xu, Singapore, SG;

Inventors:

Antoni S Murcia, Poway, CA (US);

Yinan Xu, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 29/38 (2006.01); B41J 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of an embodiment of the invention determines whether at least a portion of an image to be formed on a media sheet on a swath-by-swath basis by an image-formation mechanism includes one or more bar codes having a height that is less than a height of a swath of the image-formation mechanism. The mechanism adjusts the swath of the image-formation mechanism so that the bar codes are formed as part of the image on the media sheet within a single swath by the image-formation mechanism.


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Murcia, Antoni. (2007). Adjusting image-formation mechanism swath so that bar codes are formed within a single swath (U.S. Patent No. 7163271). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7163271

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