The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2007

Filed:

Oct. 05, 2004
Applicants:

Yuki Matsui, Nara, JP;

Akihiro Funamoto, Nara, JP;

Shigeru Aoyama, Kyoto, JP;

Inventors:

Yuki Matsui, Nara, JP;

Akihiro Funamoto, Nara, JP;

Shigeru Aoyama, Kyoto, JP;

Assignees:

Omron Corporation, Kyoto, JP;

Osaka University, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/00 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a front light equipped with a light source and a transparent plate emitting light from a light emitting surface which is situated at the reverse side against an observation side surface by conducting light from the light source, the reflection preventive patterns comprising the minute unevennessesfor prevention of reflection are formed on the light emitting surface. When a wavelength of visible light with the shortest wavelength among light which is emitted from the light sourceis λmin, the refractive index of the transparent plate is nand the refractive index of air is n, the period p of the minute unevennessessatisfies the following equation. p<λmin/(n+n). Thereby, it can be prevented that the diffracted light is emitted from the reflection preventive patterns (light emitting surface) of the transparent plate.


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