The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Aug. 20, 2004
Chang Kuo Chang, Singapore, SG;
Chi Fo Tsang, Singapore, SG;
MY the Doan, Singapore, SG;
Ramana Murthy Badam, Singapore, SG;
Vladimir Bliznetsov, Singapore, SG;
Chang Kuo Chang, Singapore, SG;
Chi Fo Tsang, Singapore, SG;
My The Doan, Singapore, SG;
Ramana Murthy Badam, Singapore, SG;
Vladimir Bliznetsov, Singapore, SG;
Agency for Science Technology and Research, Singapore, SG;
Abstract
Formation, through etching, of structures whose minimum width is less than can be achieved by optical means alone has been achieved by inserting a layer of sandwiching material between the photoresist (or hard mask if used) and the structure. By adjustment of the relative etch rates of this layer and the structure, a uniform lateral width reduction and surface smoothing of the structure is achieved.