The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Jul. 18, 2002
Mark Neil, Oxford, GB;
Farnaz Massoumian, London, GB;
Rimas Juskaitis, Oxford, GB;
Tony Wilson, Oxford, GB;
Mark Neil, Oxford, GB;
Farnaz Massoumian, London, GB;
Rimas Juskaitis, Oxford, GB;
Tony Wilson, Oxford, GB;
Isis Innovation Limited, , GB;
Abstract
A method and apparatus for generating a beam of light having extended depth of focus. The apparatus comprises, for instance, a binary phase mask that generates a diffraction pattern including a bright main ring and a plurality of side-lobe rings, an annular aperture mask that passing only a portion of the diffraction pattern, and a lens that causes light passing through the annular aperture to converge toward and cross an optical axis. Where the converging light crosses the optical axis, constructive interference takes place, thereby generating a beam of light that has extended depth of focus.