The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Jul. 08, 2003
Toshiaki Kuriyama, Suita, JP;
Yasuko Inui, Sakurai, JP;
Toshiaki Kuriyama, Suita, JP;
Yasuko Inui, Sakurai, JP;
Dai-Ichi Kogyo Seiyaku Co., Ltd., Kyoto, JP;
Abstract
A method for residual monomer diminution by which a residual monomer is speedily removed from an N-vinyl compound polymer or the like without posing a problem such as an increase in ash content; and a process for producing an N-vinyl compound polymer solution or powder which has a regulated pH and is free from a decrease in pH with time. The method comprises adding an organic acid having a boiling point of 140° C. or higher at ordinary pressure to anaqueous solution of an N-vinyl compound polymer. The process comprises adding an organic base to an aqueous N-vinyl compound polymer solution having a pH lower than 7.0 to thereby neutralize the solution and regulate the pH thereof. Those operations are conducted in a reaction vessel in which a gaseous phase is regulated so as to have an oxygen concentration of 5.0% by volume or lower.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile