The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Jan. 18, 2001
Seiji Ota, Kuga-gun, JP;
Satoru Moriya, Ichihara, JP;
Ryoji Mori, Kuga-gun, JP;
Taku Koda, Kuga-gun, JP;
Junji Tan, Kuga-gun, JP;
Shinichi Kojoh, Sodegaura, JP;
Hideyuki Kaneko, Sodegaura, JP;
Shunichi Hama, Chiba, JP;
Tadahito Nobori, Sodegaura, JP;
Tomoaki Matsugi, Sodegaura, JP;
Norio Kashiwa, Sodegaura, JP;
Seiji Ota, Kuga-gun, JP;
Satoru Moriya, Ichihara, JP;
Ryoji Mori, Kuga-gun, JP;
Taku Koda, Kuga-gun, JP;
Junji Tan, Kuga-gun, JP;
Shinichi Kojoh, Sodegaura, JP;
Hideyuki Kaneko, Sodegaura, JP;
Shunichi Hama, Chiba, JP;
Tadahito Nobori, Sodegaura, JP;
Tomoaki Matsugi, Sodegaura, JP;
Norio Kashiwa, Sodegaura, JP;
Mitsui Chemicals, Inc., Tokyo, JP;
Abstract
Olefin block copolymers (A-1) are disclosed represented by the formula (I) PO-g-B. . . (I) wherein POis a segment comprised of repeating units derived from an olefin having 2 to 20 carbon atoms, gis an ester, ether, amide, imide, urethane, urea, silylether or carbonyl linkage, and Bis a segment containing an unsaturated hydrocarbon or a hetero atom. The olefin block copolymers are suitable for uses in adhesives, various molded articles such as construction and civil engineering materials, automobile interior and exterior materials, gasoline tanks, electric and electronic parts, medical care and sanitation materials, materials of miscellaneous goods, resin materials having environmental degradation properties, films and sheets, modifiers and dispersions.