The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2007

Filed:

Oct. 12, 2002
Applicants:

Toshiya Sasaki, Takefu, JP;

Kazuyoshi Uchiyama, Takefu, JP;

Masahiko Kawaguchi, Takefu, JP;

Keishiro Amaya, Fukui, JP;

Eita Tamezawa, Fukui-ken, JP;

Inventors:

Toshiya Sasaki, Takefu, JP;

Kazuyoshi Uchiyama, Takefu, JP;

Masahiko Kawaguchi, Takefu, JP;

Keishiro Amaya, Fukui, JP;

Eita Tamezawa, Fukui-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8234 (2006.01); H01L 21/8244 (2006.01);
U.S. Cl.
CPC ...
Abstract

A small size electronic component has a small direct current resistance value of a conductor pattern and minimal dimensional irregularity of a conductor pattern. In order to form such a component, a photosensitive conductive paste applied on a ceramic substrate and is then exposed through a photo mask and developed so as to form a lower conductor pattern layer of a coil conductor pattern. Then an insulating paste is applied on the ceramic substrate so as to cover the lower conductor pattern layer and the insulating paste is removed with a solvent until at least the upper surface of the lower conductor pattern layer is exposed so as to form an inter-line insulating layer. Furthermore, after applying a photosensitive conductive paste as a film, the exposure and development operation is conducted again while using the photo mask so as to form an upper conductor pattern layer on the lower conductor pattern layer.


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