The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Jun. 12, 2003
Sridhar Sadasivan, Rochester, NY (US);
Ramesh Jagannathan, Rochester, NY (US);
Seshadri Jagannathan, Pittsford, NY (US);
Rajesh Mehta, Rochester, NY (US);
David J. Nelson, Rochester, NY (US);
Glen C. Irvin, Jr., Rochester, NY (US);
Sridhar Sadasivan, Rochester, NY (US);
Ramesh Jagannathan, Rochester, NY (US);
Seshadri Jagannathan, Pittsford, NY (US);
Rajesh Mehta, Rochester, NY (US);
David J. Nelson, Rochester, NY (US);
Glen C. Irvin, Jr., Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method of forming a color filter is provided. The method includes providing a mixture of a color filter material and a compressed fluid; providing at least a partially controlled environment for retaining a substrate, the at least partially controlled environment being in fluid communication with the mixture of the color filter material and the compressed fluid; providing a shadow mask in close proximity to the substrate retained in the at least partially controlled environment; and chargably releasing the mixture of the color filter material and the compressed fluid into the at least partially controlled environment, wherein the color filter material becomes free of the compressed fluid prior to contacting the substrate at locations defined by the shadow mask thereby forming a patterned deposition on the substrate.