The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2007

Filed:

Apr. 08, 2004
Applicants:

Chih-ho Chiu, Taipei, TW;

Hui-lung Kuo, Taipei, TW;

Yi-chun Liu, Taoyuan, TW;

Ping-chen Chen, Taipei, TW;

Inventors:

Chih-Ho Chiu, Taipei, TW;

Hui-Lung Kuo, Taipei, TW;

Yi-Chun Liu, Taoyuan, TW;

Ping-Chen Chen, Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A wire grid polarizer with double metal layers for the visible spectrum. Parallel dielectric layers having a period (p) of 10˜250 nm and a trench between adjacent dielectric layers overlie a transparent substrate. A first metal layer having a first thickness (d) of 30˜150 nm is disposed in the trench. A second metal layer having a second thickness (d) of 30˜150 nm and a width (w) overlies on the top surface of each dielectric layer. The first and second metal layers are separated by a vertical distance (l) of 10˜100 nm. The first thickness (d) is the same as the second thickness (d). A ratio of the width (w) to the period (p) is 25˜75%.


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