The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2007

Filed:

Dec. 10, 2003
Applicants:

Mitsuru Mariyama, Kitakatsuragi-gun, JP;

Masaru Kubo, Kitakatsuragi-gun, JP;

Inventors:

Mitsuru Mariyama, Kitakatsuragi-gun, JP;

Masaru Kubo, Kitakatsuragi-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/111 (2006.01);
U.S. Cl.
CPC ...
Abstract

A channel isolation regionis formed over the entire width of an N-type silicon substrate, and photothyristors, in each of which an anode diffusion region, a P-gate diffusion region, a cathode diffusion regionare formed parallel to the channel isolation regionover almost the entire width of the N-type silicon substrate, are formed in a left-hand portionand in a right-hand portionand are wired inversely parallel. Thus, the inter-channel movement of residual holes during commutation is restrained by the channel isolation region, by which commutation failure is suppressed to improve a commutation characteristic. Further, an operating current large enough for controlling a load current of approx. 0.2 A is obtained although a chip is divided by the channel isolation region. Therefore, using this bidirectional photothyristor chip makes it possible to implement an inexpensive SSR with a main thyristor eliminated.


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