The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2007

Filed:

Jun. 05, 2002
Applicants:

Gwan-sun Lee, Seoul, KR;

Young-kil Chang, Seoul, KR;

Hong-sun Kim, Seoul, KR;

Chul-hyun Park, Seongnam-si, KR;

Gha-seung Park, Goyang-si, KR;

Cheol-kyung Kim, Namyangju-si, KR;

Inventors:

Gwan-Sun Lee, Seoul, KR;

Young-Kil Chang, Seoul, KR;

Hong-Sun Kim, Seoul, KR;

Chul-Hyun Park, Seongnam-si, KR;

Gha-Seung Park, Goyang-si, KR;

Cheol-Kyung Kim, Namyangju-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 501/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

High purity cefdinir is prepared in a high yield by a process comprising the steps of: treating a crystalline salt of a cefdinir intermediate with a formic acid-sulfuric acid mixture or a formic acid-methanesulfonic acid mixture to obtain a crystalline salt of cefdinir and reacting the crystalline salt with a base in a solvent.


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