The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2007

Filed:

Oct. 23, 2002
Applicants:

Francesco Cerrina, Madison, WI (US);

Wei Huang, Madison, WI (US);

Inventors:

Francesco Cerrina, Madison, WI (US);

Wei Huang, Madison, WI (US);

Assignee:

NimbleGen Systems, Inc., Madison, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12Q 1/68 (2006.01); C07H 21/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical alignment system for a device for synthesizing DNA polymers provides for a patterned substrate for simple alignment of the system. The substrate may also be used for synthesis allowing precise alignment of the synthesis substrate during each synthesis operation. The patterning of the substrate may be used to promote separation of reaction sites.


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