The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2007
Filed:
Jul. 06, 2004
Applicant:
Yutaka Adegawa, Shizuoka, JP;
Inventor:
Yutaka Adegawa, Shizuoka, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract
An intermediate layer composition having a silicon-containing polymer(A) having a specific structure and a pattern-forming process using the same.
Adegawa, Yutaka. (2007). Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate (U.S. Patent No. 7157205). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7157205
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile