The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2007
Filed:
Jan. 23, 2004
Applicants:
Nobuo Shimizu, Suwa, JP;
Hideto Yamashita, Suwa, JP;
Inventors:
Nobuo Shimizu, Suwa, JP;
Hideto Yamashita, Suwa, JP;
Assignee:
Seiko Epson Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of manufacturing a substratewith a plurality of concave portionsaccording to the invention includes the steps of forming a maskon the substrate, forming a plurality of initial holeson the maskby means of a physical method such as blast processing or irradiation with laser beams, and forming the plurality of concave portions in the substrateby subjecting the maskwith the plurality of initial holesto an etching process. In case of carrying out the blast processing, glass beads whose average diameter is in the range of 50 to 100 μm are used as blast media.