The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2007
Filed:
Aug. 23, 2001
Pierre Vanden Brande, Overijse, BE;
Alain Weymeersch, Wavre, BE;
Pierre Vanden Brande, Overijse, BE;
Alain Weymeersch, Wavre, BE;
Cold Plasma Applications, CPA, SPRL, Limal, BE;
Abstract
A method for the deposition of a metal layer on a substrate () uses a cold plasma inside an enclosure () heated to avoid the formation of a metal deposit at its surface. The enclosure has an inlet () and an outlet () for the substrate with a source of metal vapor between them, made up of an electrode to form a plasma () with the substrate or a separate electrically conducting element as a counter-electrode. The deposition metal is introduced in the liquid state in a retention tank () and is maintained as a liquid at an essentially constant level during the formation of the metal layer on the substrate. An Independent claim is included for the device used to put this method of coating a substrate into service.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile