The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2007
Filed:
Dec. 17, 2003
Chi-an Lin, Hsinchu, TW;
Kuo-hung Kuo, Kaohsiung, TW;
Ta-hsin Kuan, Jhudong Township, Hsinchu County, TW;
Po-yi Lo, Taipei, TW;
Ming-hsien Yang, Jhudong Township, Hsinchu County, TW;
Chi-An Lin, Hsinchu, TW;
Kuo-Hung Kuo, Kaohsiung, TW;
Ta-Hsin Kuan, Jhudong Township, Hsinchu County, TW;
Po-Yi Lo, Taipei, TW;
Ming-Hsien Yang, Jhudong Township, Hsinchu County, TW;
TPO Displays Corp., Chu-Nan, TW;
Abstract
A wet etching apparatus is disclosed. The apparatus comprises a first tank, containing a first wet etching solution; a filter, having a filter cartridge, connected to the first tank to filter out the impurities in the first solution; a second etching tank, connected to the filter and the first tank in parallel, containing a second solution; a reaction tank, connected to the filter, wherein having a wet etching reaction; an exhaust component, connected to the filter and the reaction tank in parallel; a first pump, delivering the first solution to the reaction tank through the filter; and a second pump, delivering the second solution to the exhaust component to exhaust the solution from the etching tank through the filter.