The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2006
Filed:
Dec. 24, 2002
Applicant:
Shinichi Shima, Tochigi, JP;
Inventor:
Shinichi Shima, Tochigi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03B 27/32 (2006.01); G03B 27/62 (2006.01);
U.S. Cl.
CPC ...
Abstract
A scanning exposure apparatus includes a master stage which holds a master and moves in a predetermined scanning direction, a projection optical system which projects a pattern of the master onto a substrate, and an optical element which is held by the master stage and moved together with the master. The optical element is so constituted as to optically correct a shift of the master held by the master stage from an ideal state.
Shima, Shinichi. (2006). Scanning exposure apparatus, manufacturing method thereof, and device manufacturing method (U.S. Patent No. 7154581). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7154581
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile