The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2006

Filed:

Dec. 30, 2003
Applicants:

Seung-hyun Son, Gyeonggi-do, KR;

Young-mo Kim, Suwon-si, KR;

Hidekazu Hatanaka, Seongnam-si, KR;

Vassili Leniachine, Suwon-si, KR;

Nikolai Shpackovsky, Suwon-si, KR;

Sang-hun Jang, Youngin-si, KR;

Mi-jeong Song, Suwon-si, KR;

Hyo-june Kim, Youngin-si, KR;

Gi-young Kim, Chungju-si, KR;

Hyoung-bin Park, Seongnam-si, KR;

Inventors:

Seung-hyun Son, Gyeonggi-do, KR;

Young-mo Kim, Suwon-si, KR;

Hidekazu Hatanaka, Seongnam-si, KR;

Vassili Leniachine, Suwon-si, KR;

Nikolai Shpackovsky, Suwon-si, KR;

Sang-hun Jang, Youngin-si, KR;

Mi-jeong Song, Suwon-si, KR;

Hyo-june Kim, Youngin-si, KR;

Gi-young Kim, Chungju-si, KR;

Hyoung-bin Park, Seongnam-si, KR;

Assignee:

Samsung SDI Co., Ltd., Suwon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 17/49 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma display panel (PDP) and a method of manufacturing the panel includes sustain electrodes having a double gap structure and a predetermined resistance value. Each of the sustain electrodes includes a main electrode for sustaining a discharge and an auxiliary electrode for starting a low-voltage discharge without decreasing efficiency. A gap between auxiliary electrodes included in different sustain electrodes, respectively, is narrower than a gap between the different sustain electrodes. Each auxiliary electrode is formed between barrier ribs or immediately above a barrier rib. A ditch is formed in a dielectric layer covering the main electrodes and the auxiliary electrodes. The ditch is formed immediately above an auxiliary electrode.


Find Patent Forward Citations

Loading…