The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2006
Filed:
Dec. 09, 2002
Applicants:
Masato Imai, Kanagawa, JP;
Akira Maehara, Kanagawa, JP;
Yoko Fukunaga, Kanagawa, JP;
Inventors:
Assignee:
Sony Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
Abstract
A mask for photolithography in which a semi-transmission film is formed so that the phase difference of lights passing through a semi-transmission portion and a transmission portion of the mask for photolithography is between (−¼+2 m).π and (¼+2 m).π inclusive, where m is an integer. The invention makes it possible to efficiently and properly form a thin film having a multi-step structure by a single process.
Imai, Masato. (2006). Mask for photolithography, method of forming thin film, liquid crystal display device, and method of producing the liquid crystal display device (U.S. Patent No. 7153614). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7153614
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile