The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2006
Filed:
Sep. 03, 2002
Masaaki Kurihara, Tokyo, JP;
Shigekazu Fujimoto, Tokyo, JP;
Tetsuro Komukai, Tokyo, JP;
Tetsuro Inui, Tokyo, JP;
Masaaki Kurihara, Tokyo, JP;
Shigekazu Fujimoto, Tokyo, JP;
Tetsuro Komukai, Tokyo, JP;
Tetsuro Inui, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Toyko, JP;
Nippon Telegraph and Telephone Corporation, Tokyo, JP;
Abstract
The invention relates to a process for the fabrication of an optical fiber-processing phase mask that is reduced in terms of pitch variations on the mask and stitching errors, and provides a process for the fabrication of a chirped type optical fiber-processing phase mask wherein a grating form of grooves provided in one surface of a quartz substrate is configured as an optical fiber-processing grating pattern. At an exposure step, writing data obtained by arranging and compiling a plurality of data for a repetitive groove-and-strip pattern while the pitch of repetition is modulated are used and an electron beam resist is provided on a phase mask blank, so that writing is carried out all over the writing area on said phase mask blank continuously in a vertical direction to said grating form of grooves.