The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2006
Filed:
Oct. 10, 2003
Applicants:
Junaid Ahmed Siddiqui, Richmond, VA (US);
Timothy Frederick Compton, Casa Grande, AZ (US);
Bin HU, Chandler, AZ (US);
Robin Edward Richards, Phoenix, AZ (US);
Inventors:
Junaid Ahmed Siddiqui, Richmond, VA (US);
Timothy Frederick Compton, Casa Grande, AZ (US);
Bin Hu, Chandler, AZ (US);
Robin Edward Richards, Phoenix, AZ (US);
Assignee:
Dupont Air Products Nanomaterials LLC, Tempe, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09G 1/04 (2006.01); C09K 13/14 (2006.01); B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A composition and associated method for chemical mechanical planarization (or other polishing) are described which afford high tantalum to copper selectivity in copper CMP and which are tunable (in relation to polishing performance). The composition comprises an abrasive and an N-acyl-N-hydrocarbonoxyalkyl aspartic acid compound and/or a tolyltriazole derivative.